Effect of Chemical Etching on Boron Nitride Film Formation on Glass Surfaces by Hydrothermal Method

Can S., Kuru D., Emir P.

13. Uluslararası Akademik Araştırmalar Kongresi , Çankırı, Türkiye, 7 - 08 Mayıs 2024, ss.1-2

  • Yayın Türü: Bildiri / Özet Bildiri
  • Basıldığı Şehir: Çankırı
  • Basıldığı Ülke: Türkiye
  • Sayfa Sayıları: ss.1-2
  • Bilecik Şeyh Edebali Üniversitesi Adresli: Evet

Özet

In this study, boron nitride (BN) films were produced on glass surfaces for the first time at low temperature using the hydrothermal synthesis method. Surface etching is one of the critical issue to form a homogeneous film on glass surfaces. Herein, the coatings were formed after the glass surfaces were kept in hydrofluoric acid (HF) solution for different periods of time (90 and 150 seconds). The effects of chemical etching on boron nitride film formation on the surface were determined by various characterization techniques. Morphological features of the coating were determined by Scanning Electron Microscope (SEM). The transmittance of the films was determined by UV-Vis spectrophotometry and the presence of boron nitrides on the surface was confirmed by X-Ray Diffractometer (XRD) and Fourier Transform Infrared Spectroscopy (FT-IR). IR and XRD spectra confirm the formation of boron nitride film on the 150 s etched surface. Optical results show that glass surfaces coated with BN absorb the UV region and the transmittance is around 30%. SEM results show that chemical etching is effective and BN grows vertically on the glass surface as a result of successful chemical etching.