The Effect of Pressure on the Microstructural Behavior on SnO2 Thin Films Deposited by RF Sputtering | AVESİS

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The Effect of Pressure on the Microstructural Behavior on SnO2 Thin Films Deposited by RF Sputtering

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GÜLER M. O., ALAF M., ALP A., AKBULUT H.

ASME 2. Annual Multifunctional NanocompositesNanomaterials: International ConferenceExhibition, 11 - 13 January 2008, (Full Text)

Publication Type: Conference Paper / Full Text
Doi Number: 10.1115/mn2008-47071
Bilecik Şeyh Edebali University Affiliated: No