A New Way in Chemical Bath Deposition of PbSe Thin Films


ÖNAL M.

JOM, cilt.77, sa.9, ss.6521-6529, 2025 (SCI-Expanded) identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 77 Sayı: 9
  • Basım Tarihi: 2025
  • Doi Numarası: 10.1007/s11837-025-07430-y
  • Dergi Adı: JOM
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus, ABI/INFORM, Aerospace Database, Applied Science & Technology Source, Communication Abstracts, Compendex, Computer & Applied Sciences, INSPEC, Metadex, Civil Engineering Abstracts
  • Sayfa Sayıları: ss.6521-6529
  • Bilecik Şeyh Edebali Üniversitesi Adresli: Evet

Özet

The chemical bath deposition method was employed to obtain PbSe thin films. This study aims to achieve high-quality films with uniform morphology and strong adhesion to glass substrates, which can be deposited at room temperature and within relatively short deposition periods. For this purpose, Pb(NO3)2, TEA, selenourea, and NH3 were used together for the first time. XRD results showed that all films have a cubic crystal structure. Additionally, calculations showed that the crystallite sizes were in the range of 35.5–45.0 nm. According to SEM images, all THE films exhibited a spherical grain structure. According to the EDS analysis, a dominance of Se over Pb was observed in all THE samples, indicating a possible p-type conductivity. Additionally, the Se/Pb ratio varied between 1.1 and 1.4, depending on the amount of TEA used. It was determined that the surface roughness values obtained from AFM and SEM images were approximately the same, and these values were between 15.3 nm and 22.1 nm according to AFM data and between 17.78 nm and 29.91 nm according to SEM data. Surface resistance values were measured by the four-probe method, and these values were found to be between 0.211 kΩcm and 5.781 kΩcm.